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MEMS
Photomask
A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography and the production of microfluidic patterns.
MiNAN's photomask is made by quartz glass and soda glasses with following spec:
1. Minimum line width 1.5um, resolution 0.2um
2. 4in~6in wafer photolithography
Our customer can provide CAD file and we provide Mask Design for approval.
We provide 1~2 weeks time fabrication service.
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